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| Serial number | Project | Detail |
| 1 | Suitable for silicon wafer size | 156mm-230mm（Customized according to customer needs）Thickness 150-200um |
| 2 | Suitable for silicon wafer types | Monocrystalline silicon wafer, polycrystalline silicon wafer; Boron doped, grain doped, xin single crystal |
| 3 | Device beat | ≤0.81s |
| 4 | Uptime | ≥98% |
| 5 | Temperature control range | 25~300℃ Continuous adjustable, with automatic control over temperature |
| 6 | The non-uniformity of the transverse temperature of the process chamber | The temperature difference between the two cells≤5℃ |
| 7 | Conversion efficiency |
The conversion efficiency of single crystal perc cells was 0.05 after anti-attenuation treatment. Or not lower than before anti-attenuation （The efficiency of electric injection is related to the efficiency of incoming materials and other factors, and the actual efficiency is not lower than that of other equipment in the industry）。 |
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